Precision observation and manufacturing scenarios in different fields have different and stringent requirements for equipment performance, and the LFS laser image focusing system builds a solution that covers multiple scenarios through a rich matrix of sensor models.

The LFS laser image focusing system offers a variety of sensor models that are not simply fine-tuned parameters, but are deeply customized for different application scenarios. For example, the model for semiconductor wafer inspection features nanometer resolution and anti-electromagnetic interference design to maintain stable measurements in high-frequency vibration workshop environments, while the model for biological sample observation optimizes the response to low-light environments to avoid damage to living cells by bright light.

LFS Laser Image Focusing System product parameters:

In the field of industrial quality inspection, electronic component solder joint inspection requires fast response sensors, LFS's high-speed model can complete a focus and measurement within 0.1 seconds to match the high-speed beat of the production line; while in archaeological sample restoration, the high-precision model captures the fine lines on the surface of cultural relics with a measurement accuracy of 0.01 micron.

The LFS laser image focusing system can be flexibly adapted to the diversified needs from research laboratories to industrial production lines. Users do not need to customize new equipment for special scenarios, just select the adapted model can be quickly deployed, significantly shortening the project landing cycle, and truly realize the “on-demand customization” of efficient adaptation.